Blank Cover Image

ArF photoresist parameter optimization for mask error enhancement factor reduction [5853-60]

著者名:
Lee, C. H.
Han, S.
Park, K. S.
Yoon, S. ( Samsung Electronics Co. (South Korea) )
Kang, H. Y.
Oh, H. W.
Lee, J. E. ( Hanyang Univ. (South Korea) )
Kim, Y. H.
Kim, T. S. ( Samsung Electronics Co. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
さらに 5 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5853
発行年:
2005
パート:
2
開始ページ:
749
終了ページ:
756
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
言語:
英語
請求記号:
P63600/5853
資料種別:
国際会議録

類似資料:

1 国際会議録 ArF photoresist parameter optimization for mask error enhancement factor reduction

Chang Ho Lee, Seok Han, Kyung Sil Park, Hye Young Kang, Hyun Wook Oh, Ji Eun Lee, Kyung Me Kim, Young Ho Kim, Tae Sung …

SPIE - The International Society of Optical Engineering
7 国際会議録 Terpolymer of maleic anhydride and cycloolefin derivatives as an ArF photoresist

Kim,S.-J., Park,J.-H., Kim,J.-H., Kim,K.-D., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H.

SPIE-The International Society for Optical Engineering
2 国際会議録 Mask error enhancement factor variation with pattern density [5992-104]

Kang, H. -Y., Kim, S. -H., Lee, C. -H., Oh, H. -K.

SPIE - The International Society of Optical Engineering
8 国際会議録 Nonshrinkable photoresists for ArF lithography

Kim, J.-B., Oh, T.H., Choi, J.-H., Lee, J.-J.

SPIE-The International Society for Optical Engineering
3 国際会議録 Study of Cr patch validity for ArF CPL mask and its fabrication

Kim, C.-H., Kim, S.-H., Lee, M.-S., Park, J.-S., Shin, I.-G., Choi, S.-W., Yoon, H.-S., Han, W.-S.

SPIE - The International Society of Optical Engineering
9 国際会議録 ArF issues of 90-nm-node DRAM device integration

Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
4 国際会議録 ArF photoresist system using alicyclic polymer

Park,J.-H., Kim,S.-J., Park,S.-Y., Lee,H., Jung,J.-C., Bok,C.-K., Baik,K.-H.

SPIE-The International Society for Optical Engineering
10 国際会議録 Optical proximity correction considering mask manufacturability and its application to 0.25-ｦﾌm DRAM for enhanced device performance

Park,C.-H., Rhie,S.-U., Choi,J.-H., Park,J.-S., Seo,H.-W., Kim,Y.-H., Park,Y.-K., Han,W.-S., Lee,W.-S., Kong,J.-T.

SPIE - The International Society for Optical Engineering
5 国際会議録 Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

Yu, S.-Y., Kim, S.-H., Cha, B.-C., Kim, Y.-H., Choi, S.-W., Yoon, H.-S., Han, W.-S.

SPIE - The International Society of Optical Engineering
11 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography

Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S.

SPIE-The International Society for Optical Engineering
6 国際会議録 Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

Lee, C. H., Han, S., Park, K. S., Kang, H. Y., Oh, H. W., Lee, J. E., Kim, K. M., Kim, Y. H., Kim, T. S., Oh, H.-K.

SPIE - The International Society of Optical Engineering
12 国際会議録 Spatial optical modulator (SOM): high-density diffractive laser projection display

S. Yun, J. Song, I. Yeo, Y. Choi, V. Yurlov, S. An, H. Park, H. Yang, Y. Lee, K. Han, I. Shyshkin, A. Lapchuk, K. Oh, S. …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12