Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]

Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]

著者名:

Hsu, M.

Shi, X. ( ASML MaskTools Inc. (USA) )

さらに 4 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

2

開始ページ:

659

終了ページ:

671

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

類似資料:

1 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering	7 国際会議録 Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL) Van Den Broeke, D.J., Laidig, T.L., Wampler, K.E., Hsu, S., Shi, X., Hsu, M., Burchard, P., Chen, J.F. SPIE-The International Society for Optical Engineering
2 国際会議録 Manufacturing implementation of IML technology for 45nm node contact masks [6283-65] Van Den Broeke, D., Hsu, M., Chen, F. J., Hsu, S., Hollerbach, U., Laidig, Y. SPIE - The International Society of Optical Engineering	8 国際会議録 Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T. SPIE-The International Society for Optical Engineering
3 国際会議録 Lithography manufacturing implementation for 65 nm and 45 nm nodes with model-based scattering bars using IML technology Nam, D., Milster, T. D., Chen, T. SPIE - The International Society of Optical Engineering	9 国際会議録 RET masks for the final frontier of optical lithography [5853-104] Chen, J. F., Broeke, D. van den, Hsu, S., Hsu, M. C.W., Laidig, T., Shi, X., Chen, T., Socha, R. J., Hollerbach, U., … SPIE - The International Society of Optical Engineering
4 国際会議録 Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL Hsu, M., Laidig, T.L., Wampler, K.E., Hsu, S.D., Shi, X., Chen, J.F., Van Den Broeke, D.J., Hsieh, F. SPIE - The International Society of Optical Engineering	10 国際会議録 65-nm full-chip implementation using double dipole lithography Hsu, S.D., Chen, J.F., Cororan, N., Knose, W.T., Broeke, D.J.V.D., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, C.M., … SPIE-The International Society for Optical Engineering
5 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering	11 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering
6 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N.P., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering	12 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12