Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing [5853-19]
- 著者名:
- Kim, S.-K.
- Kim, B.-G.
- Moon, S.-Y.
- Choi, S.-W.
- Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 425
- 終了ページ:
- 431
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
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2
国際会議録
Resolution improvement of chemical-amplification resist using process-induced effect correction
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SPIE - The International Society of Optical Engineering |
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12
国際会議録
Diffusion parameter analysis for chemical amplification resists as a function of resist process
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