Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]
- 著者名:
Ki, W.-T. Ahn, B.-S. Park, J.-S. Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Ma, S.-B. ( Hanyang Univ. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 416
- 終了ページ:
- 424
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
国際会議録
Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Resolution improvement of chemical-amplification resist using process-induced effect correction
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |