Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114]

Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114]

著者名:

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

1

開始ページ:

252

終了ページ:

264

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

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2 国際会議録 Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering	8 国際会議録 Low k1 lithography patterning option for the 90-nm and 65-nm nodes Hsu, S.D., Van Den Broeke, D.J., Shi, X., Hsu, M., Wampler, K.E., Chen, J.F., Yu, A., Yang, S.C., Hsieh, F. SPIE-The International Society for Optical Engineering
3 国際会議録 Dark field double dipole lithography (DDL) for 45 nm node and beyond [6283-103] Hsu, S., Burkhardt, M., Park, J., Van Den Broeke, D., Chen, F. J. SPIE - The International Society of Optical Engineering	9 国際会議録 65-nm full-chip implementation using double dipole lithography Hsu, S.D., Chen, J.F., Cororan, N., Knose, W.T., Broeke, D.J.V.D., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, C.M., … SPIE-The International Society for Optical Engineering
4 国際会議録 RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114] Hsu, M., Chen, F. J., Van Den Broeke, D., En Tszng, S., Shieh, J., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering	10 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering
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6 国際会議録 Double dipole lithography for 65-nm node and beyond: a technology readiness review Hsu, S.D., Eurlings, M., Hendrickx, E., Van Den Broeke, D.J., Chiou, T.-B., Chen, J.F., Laidig, T.L., Shi, X., Finders, … SPIE - The International Society of Optical Engineering	12 国際会議録 Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL) Van Den Broeke, D.J., Laidig, T.L., Wampler, K.E., Hsu, S., Shi, X., Hsu, M., Burchard, P., Chen, J.F. SPIE-The International Society for Optical Engineering

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