Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]
- 著者名:
Philipsen, V. Leunissen, L. De Ruyter, R. Jonckheere, R. ( IMEC (Belgium) ) Marlin, P. ( Photronics (USA) ) Wakefield, C. ( Photronics (United Kingdom) ) Johnson, S. Cangemi, M. ( Photronics (Belgium) ) Buxbaum, A. Morrison, T. ( FEI Co. (USA) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 211
- 終了ページ:
- 222
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
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9
国際会議録
Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
SPIE - The International Society of Optical Engineering |
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国際会議録
Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |