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RET masks for the final frontier of optical lithography [5853-104]

著者名:
Chen, J. F.
Broeke, D. van den
Hsu, S.
Hsu, M. C.W.
Laidig, T.
Shi, X.
Chen, T. ( ASML MaskTools (USA) )
Socha, R. J. ( ASML TDC (USA) )
Hollerbach, U.
Wampler, K. E.
Park, J.
Park, S.
Gronlund, K. ( ASML MaskTools (USA) )
さらに 8 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5853
発行年:
2005
パート:
1
開始ページ:
168
終了ページ:
179
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458537 [0819458538]
言語:
英語
請求記号:
P63600/5853
資料種別:
国際会議録

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7 国際会議録 OPC model calibration for CPL patterning at extreme low k1

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