Self-assembled Ni nanodot on SiO2 film: A novel reactive ion etching mask for Si nanopillar formation on Si substrate [6195-51]

Self-assembled Ni nanodot on SiO2 film: A novel reactive ion etching mask for Si nanopillar formation on Si substrate [6195-51]

著者名:

Lin, -S. H.
Kao, -C. C.
Kuo, -C. H.
Wang, -C. S.
Lin, -R. G. ( National Chiao Tung Univ. (Taiwan) )

掲載資料名:

Nanophotonics

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6195

発行年:

2006

開始ページ:

61950W

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819462510 [0819462519]

言語:

英語

請求記号:

P63600/6195

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016419
シリーズID:	PA00000029
会議名:	Photonics Europe : Nanophotonics
回次:	2006
会議開催地:	Strasbourg, France
会議開催年:	2006.04.03-2006.04.05

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