Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186]

Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186]

著者名:

Moore, A.

Abrams, D. ( Luminescent Technologies, Inc. (USA) )

さらに 1 件

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

2

開始ページ:

63494T

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

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2 国際会議録 SRAF placement and sizing using inverse lithography technology T. Lin, F. Robert, A. Borjon, G. Russell, C. Martinelli, A. Moore, Y. Rody SPIE - The International Society of Optical Engineering	8 国際会議録 Laser and e-beam mask-to-silicon with inverse lithography technology (ILT) [5992-74] Pang, L., Shamma, N., Rissman, P., Abrams, D. SPIE - The International Society of Optical Engineering
3 国際会議録 Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm L. Pang, Y. Liu, D. Abrams SPIE - The International Society of Optical Engineering	9 国際会議録 Inverse lithography technology at chip scale [6154-41] Lin, B., Shieh, M. F., Sun, J., Ho, J., Wang, Y., Wu, X., Leitermann, W., Lin, O., Lin, J., Liu, Y., Pang, L. SPIE - The International Society of Optical Engineering
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