Multi-point CD measurement method to evaluate pattern fidelity and performance of mask [6349-155]
- 著者名:
Kim, M. Lee, H. Seo, K. Lee, D. Choi, Y. Oh, S. Han, O. ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Photomask Technology 2006
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6349
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 634944
- 終了ページ:
- 634945
- 総ページ数:
- 2
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- 言語:
- 英語
- 請求記号:
- P63600/6349
- 資料種別:
- 国際会議録
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