Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking [6349-124]

Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking [6349-124]

著者名:

Nataraju, M.

Sohn, J.

Mikkelson, A. R.

Turner, K. T.

Engelstad, R. L. ( Univ. of Wisconsin, Madison (USA) )

Van Peski, C. K. ( Sematech, Inc. (USA) )

さらに 1 件

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

2

開始ページ:

634939

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

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1 国際会議録 Electrostatic chucking of EUVL reticles M. Nataraju, J. Sohn, A. R. Mikkelson, R. L. Engelstad, K. T. Turner, C. K. V. Peski, K. J. Orvek SPIE - The International Society of Optical Engineering	7 国際会議録 Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks R. L. Engelstad, K. T. Turner, M. Nataraju, J. Sohn, A. R. Mikkelson Society of Photo-optical Instrumentation Engineers
2 国際会議録 Measuring force uniformity in electrostatic chucking of EUVL masks [6349-126] Sohn, J., Veerarghavan, S., Turner, K. T., Engelstad, R. L., Van Peski, C. K. SPIE - The International Society of Optical Engineering	8 国際会議録 Effect of electrostatic chucking on EUVL mask flatness Mikkelson, A. R., Engelstad, R. L., Lovell, E. G., Aschke, L., Ruggeberg, F., Sobel, F. SPIE - The International Society of Optical Engineering
3 国際会議録 Compensating for image placement errors induced during the fabrication and chucking of EUVL masks R. L. Engelstad, J. Sohn, A. R. Mikkelson, M. Nataraju, K. T. Turner Society of Photo-optical Instrumentation Engineers	9 国際会議録 EUV mask stress mapping by an experimental and hybrid finite element technique Feng, Z., Lovell, E.G., Engelstad, R.L., Mikkelson, A.R., Reu, P.L., Sohn, J., Blaedel, K.L., Claudet, A.A. SPIE-The International Society for Optical Engineering
4 国際会議録 EUV mask and chuck analysis: simulation and experimentation [6151-12] Nataraju, M., Sohn, J, Mikkelson, A. R., Turner, K. T., Engelstad, R. L., Van Peski, C. K. SPIE - The International Society of Optical Engineering	10 国際会議録 The influence of an electrostatic pin chuck on EUV mask flatness Dicks, G. A., Mikkelson, A. R., Engelstad, R. L. SPIE - The International Society of Optical Engineering
5 国際会議録 Electrostatic chucking and EUVL mask flatness analysis [5992-128] Nataraju, M., Mikkelson, A., Sohn, J., Engelstad, R. L., Lovell, E. G. SPIE - The International Society of Optical Engineering	11 国際会議録 Modeling LEEPL mask fabrication processes Azkorra, X., Mikkelson, A.R., Engelstad, R.L., Lovell, E.G., Chang, J., Sohn, J., Nataraju, M., Eguchi, H. SPIE - The International Society of Optical Engineering
6 国際会議録 Predicting and correcting for image placement errors during the fabrication of EUVL masks R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner SPIE - The International Society of Optical Engineering	12 国際会議録 Predicting the influence of trapped particles on EUVL reticle distortion during exposure chucking [6349-123] Romaswamy, V., Turner, K. T., Engelstad, R. L., Lovell, E. G. SPIE - The International Society of Optical Engineering

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