EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]
- 著者名:
Kim, D. Y. Cho, S. Y. Kim, H. Huh, S. M. Chung, D. H. Cha, B. C. Lee, J. W. Choi, S. W. Han, W. S. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, K. H. Kim, E. J. Guo, Z. Quach, E. Gee, D. Brown, T. - 掲載資料名:
- Photomask Technology 2006
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6349
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 63492L
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- 言語:
- 英語
- 請求記号:
- P63600/6349
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
5
国際会議録
Study of mask structure for 45-nm node based on manufacturability and lithographic performance
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |