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Required mask specification for mass production devices below 65-nm design node [6349-81]

著者名:
Nam, D.
Choi, S.
Doh, J.
Noh, Y.
Lee, H.
Sin, Y.
Kim, B.
Kang, M.
Han, W. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 4 件
掲載資料名:
Photomask Technology 2006
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6349
発行年:
2006
パート:
1
開始ページ:
634928
終了ページ:
634928
総ページ数:
1
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
言語:
英語
請求記号:
P63600/6349
資料種別:
国際会議録

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