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Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]

著者名:
Park, J.
Hsu, S.
Van Den Broeke, D.
Chen, J. F. ( ASML MaskTools (USA) )
Dusa, M.
Socha, R. ( ASML Technology Development Ctr. (USA) )
Finders, J.
Vleeming, B.
van Oosten, A.
Nikolsky, P. ( ASML Netherlands B.V. (Netherlands) )
Wiaux, V.
Hendrickx, E.
Bekaert, J.
Vandenberghe, G. ( IMEC vzw (Belgium) )
さらに 9 件
掲載資料名:
Photomask Technology 2006
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6349
発行年:
2006
パート:
1
開始ページ:
634922
終了ページ:
634922
総ページ数:
1
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
言語:
英語
請求記号:
P63600/6349
資料種別:
国際会議録

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