Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]
- 著者名:
- Chalykh, R.
- Pundaleva, I.
- Kim, S.
- Cho, H.-K.
- Moon, J.-T. ( Samsung Electronics Co. (South Korea) )
- 掲載資料名:
- Photomask Technology 2006
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6349
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 63491K
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- 言語:
- 英語
- 請求記号:
- P63600/6349
- 資料種別:
- 国際会議録
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3
国際会議録
Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49]
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SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |