Image degradation due to phase effects in chromeless phase lithography [6349-38]

Image degradation due to phase effects in chromeless phase lithography [6349-38]

著者名:

Bubke, K.

Sczyrba, M.

Park, K. T.

Neubauer, R. ( Advanced Mask Technology Ctr. GmbH & Co. KG (Germany) )

Pforr, R.

Reichelt, J.

Ziebold, R. ( Qimonda Dresden GmbH & Co. OHG (Germany) )

さらに 2 件

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

1

開始ページ:

634913

終了ページ:

634914

総ページ数:

2

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

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