Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography [6349-20]

Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography [6349-20]

著者名:

Lucas, K. ( Freescale Semiconductor (France) )

Gordon, J. S. ( Toppan Photomasks, Inc. (USA) )

Conley, W.

Saied, M.

Warrick, S. ( Freescale Semiconductor (France) )

Pochkowski, M.

Smith, M. D. ( KLA-Tencor (USA) )

West, C.

Kalk, F. ( Toppan Photomask (USA) )

Kuijten, J. P. ( ASML (Netherlands) )

さらに 5 件

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

1

開始ページ:

63490K

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

類似資料:

1 国際会議録 Extending immersion lithography to the 32-nm node S. Warrick, W. Conley, V. Farys, M. Benndorf, J. Gemmink, Y. Trouiller, J. Belledent, D. Jovanovic, P. Gouraud SPIE - The International Society of Optical Engineering	7 国際会議録 Reflection control for immersion lithography at 45/32-nm nodes W.-J. Tseng, R.-H. Hsu, S. H. Hou, T.-H. Tseng, B. Lin Society of Photo-optical Instrumentation Engineers
2 国際会議録 Integrating immersion lithography in 45-nm logic manufacturing M. Benndorf, S. Warrick, W. Conley, D. Cruau, D. DeSimone, K. Mestadi, V. Farys, J. Gemmink SPIE - The International Society of Optical Engineering	8 国際会議録 Assessment of complementary double dipole lithography for 45 nm and 32 nm technologies Postnikov, S. V., Robert, E., Thony, P., Patterson, K., Warrick, S., Henry, D., Torres, A., Toublon, O. SPIE - The International Society of Optical Engineering
3 国際会議録 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, … SPIE - The International Society of Optical Engineering	9 国際会議録 Water immersion optical lithography for 45-nm node Smith, B.W., Kang, H., Bourov, A., Cropanese, F., Fan, Y. SPIE-The International Society for Optical Engineering
4 国際会議録 Evaluation of 32nm advanced immersion lithography pellicles N. Zhou, K. Racette, M. Hibbs, T. Mizoguchi, D. Hasselbeck Society of Photo-optical Instrumentation Engineers	10 国際会議録 Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
5 国際会議録 Immersion lithography robustness for the C065 node [6154-07] Warrick, S., Morton, R., Mauri, A., Chapon, J. D, Belledent, J., Conley, W., Barr, A., Lucas, K., Monget, C., Plantier, … SPIE - The International Society of Optical Engineering	11 国際会議録 Process, design and optical proximity correction requirements for the 65nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering
6 国際会議録 Resist component leaching in 193-nm immersion lithography Chapon, J.-D., Chaton, C., Gouraud, P., Broekaart, M., Warrick, S., Guilmeau, I., Trauiller, Y., Belledent, J. SPIE - The International Society of Optical Engineering	12 国際会議録 45-32-nm node photomask technology with water immersion lithography [6349-134] Adachi, T., Inazuki, Y., Sutou, T., Morikawa, Y., Toyama, N., Mohri, H., Hayashi, N. SPIE - The International Society of Optical Engineering

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