Simulation and experiments for inspection properties of EUV mask defects [6283-85]
- 著者名:
Park, J. Kim, -S. S. Lee, S. Woo, -G. S. Cho, -K. H. Moon, -T. J. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6283
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 62833E
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- 言語:
- 英語
- 請求記号:
- P63600/6283
- 資料種別:
- 国際会議録
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