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Photomask dry-etching techniques for hard mask [6283-24]

著者名:
Kwon, -W. S.
Park, -J. Y.
Kim, -Y. S.
Lee, H.
Kwon, -J. H.
Choi, -W. H.
Han, -S. W. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 2 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6283
発行年:
2006
パート:
2
開始ページ:
62831T
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
言語:
英語
請求記号:
P63600/6283
資料種別:
国際会議録

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