Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
- 著者名:
Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) ) Philipsen, V. Leunissen, A. H. L. Hendrickx, E. Jonckheere, R. Vandenberghe, G. ( IMEC (Belgium) ) Buttgereit, U. Becker, H. ( Schott Lithotec AG (Germany) ) Koepernik, C. Irmscher, M. ( Institut fur Mikroelektronik Stuttgart (Germany) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6283
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 62831G
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- 言語:
- 英語
- 請求記号:
- P63600/6283
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |