A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117] | 東京工業大学附属図書館文献データベース

Blank Cover Image

A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117]

著者名:

Van Den Broeke, D.

Chen, F. J. ( ASML MaskTools (USA) )

van der Heijden, E.

Engelen, A. ( ASML (Netherlands) )

Socha, R. ( ASML TDL (USA) )

さらに 9 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6283

発行年:

2006

パート:

1

開始ページ:

62831A

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

言語:

英語

請求記号:

P63600/6283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016290
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2006 : 13th
会議開催地:	Yokohama, Japan
会議開催年:	2006.04.18-2006.04.20

類似資料:

1 国際会議録 Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60] Chen, T., Van Den Broeke D, Hsu, S, Park S, Berger G, Coskun T, De Vocht J, Corcoran N, Chen F, Van der Heijden, Finders … SPIE - The International Society of Optical Engineering	7 国際会議録 Manufacturing implementation of IML technology for 45nm node contact masks [6283-65] Van Den Broeke, D., Hsu, M., Chen, F. J., Hsu, S., Hollerbach, U., Laidig, Y. SPIE - The International Society of Optical Engineering
2 国際会議録 Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110] Chen, T., Van Den Broeke, D., Hsu, S., Park, S., Berger, G., Coskun, T., de Vocht, J., Chen, F., Socha, R., Park, J., … SPIE - The International Society of Optical Engineering	8 国際会議録 Dark field double dipole lithography (DDL) for 45 nm node and beyond [6283-103] Hsu, S., Burkhardt, M., Park, J., Van Den Broeke, D., Chen, F. J. SPIE - The International Society of Optical Engineering
3 国際会議録 RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114] Hsu, M., Chen, F. J., Van Den Broeke, D., En Tszng, S., Shieh, J., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering	9 国際会議録 Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114] Hsu, S., Van Den Broeke, D., Chen, J. F., Park, J., Hsu, M. C. W. SPIE - The International Society of Optical Engineering
4 国際会議録 Precision process calibration and CD predictions for low-k1 lithography [5853-64] Chen, T., Park, S., Berger, G., Coskun, T. H., de Vocht, J., Chen, F., Yu, L., Hsu, S., van den Broeke, D., Socha, R., … SPIE - The International Society of Optical Engineering	10 国際会議録 Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering
5 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering	11 国際会議録 Masks for flash memory gates for the 45nm node: binary or attenuated? E. van Setten, A. Engelen, J. Finders, M. Dusa SPIE - The International Society of Optical Engineering
6 国際会議録 Double exposure technique for 45nm node and beyond [5992-63] Hsu, S., Park, J., Van Den Broeke, D., Chen, J. F. SPIE - The International Society of Optical Engineering	12 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75] Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12