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Lithography process window enhancement using integrated design defect detection and fix [6283-100]

著者名:
Su, B. ( KLA-Tencor Corp. (USA) )
Ma, M. ( Aprio Technologies, Inc. (USA) )
Vikram, A.
Volk, W.
Du, H.
Verma, G. ( KLA-Tencor Corp. (USA) )
Morse, R. ( Aprio Technologies, Inc. (USA) )
Chu, C.
Tsao, B.
Lin, C.
Chou, J.
Tsai, S. ( ProMOS Technologies Inc. (Taiwan) )
さらに 7 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6283
発行年:
2006
パート:
1
開始ページ:
62830Q
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
言語:
英語
請求記号:
P63600/6283
資料種別:
国際会議録

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