CD and profile metrology of embedded phase shift masks using scatterometry [6281-46]
- 著者名:
- Lee, M. K. ( Intel Corp. (USA) )
- Yedur, S. ( Timbre Technologies (USA) )
- Hetzer, D. ( Tokyo Electron Europe Ltd. (Germany) )
- Tavassoli, M.
- Baik, K. ( Intel Corp. (USA) )
- 掲載資料名:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6281
- 発行年:
- 2006
- 開始ページ:
- 62810Z
- 出版情報:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- 言語:
- 英語
- 請求記号:
- P63600/6281
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |