Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16]
- 著者名:
Gans, F. Liebe, R. Heins, Th. Richter, J. ( Advanced Mask Technology Ctr. (Germany) ) Hasler-Grohne, W. Frase, G. C. Bodermann, B. Czerkas, S. Dirscherl, K. Bosse, H. ( Physikalisch-Technische Bundesanstalt (Germany) ) - 掲載資料名:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6281
- 発行年:
- 2006
- 開始ページ:
- 62810D
- 出版情報:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- 言語:
- 英語
- 請求記号:
- P63600/6281
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Comparative scatterometric CD measurements on a MoSi photo mask using different metrology tools
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |