Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]
- 著者名:
Borjon, A. ( Philips Semiconductors (France), Freescale Semicondutor (France), LETI-CEA (France), STMicroelectronics (France), and LTM-CNRS, CEA Grenoble (France) ) Belledent, J. ( Philips Semiconductors (France) ) Trouiller, Y. ( LETI-CEA (France) ) Lucas, K. ( Fresscale Semicondutor (France) ) Couderc, C. ( Philips Semiconductors (France) ) Sundermann, F. ( STMicroelectronics (France) ) Urbani, J. C. ( STMicroelectronics (France) ) Rody, Y. ( Philips Semiconductors (France) ) Gardin, G. ( Freescale, Semicondutor (France) ) Foussadier, F. ( STMicroelectronics (France) ) Schiavone, P ( LTM-CNRS, CEA Grenoble (France) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 3
- 開始ページ:
- 61544D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Improving model-based OPC performance for the 65-nm node through calibration set optimization
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |