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Dual anti-reflection layers for ARC/hard-mask applications [6154-144]

著者名:
Huang, V. ( Macronix International Co.. Ltd. (Taiwan) )
Wu, T. S. ( Macronix International Co.. Ltd. (Taiwan) )
Yang, M. ( Macronix International Co.. Ltd. (Taiwan) )
Lin, F. ( Macronix International Co.. Ltd. (Taiwan) )
Yang, E. ( Macronix International Co.. Ltd. (Taiwan) )
Yang, T. H. ( Macronix International Co.. Ltd. (Taiwan) )
Chen, K. C. ( Macronix International Co.. Ltd. (Taiwan) )
Ku, J. ( Macronix International Co.. Ltd. (Taiwan) )
Lu, C. Y. ( Macronix International Co.. Ltd. (Taiwan) )
さらに 4 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
3
開始ページ:
61543Q
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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