Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138]
- 著者名:
Park, S.J. ( DongbuAnam Semiconductor (South Korea) ) Shim, Y.A. ( DongbuAnam Semiconductor (South Korea) ) Kang, J.H. ( DongbuAnam Semiconductor (South Korea) ) Choi,J Y ( DongbuAnam Semiconductor (South Korea) ) Yoon K H ( DongbuAnam Semiconductor (South Korea) ) Lee Y S ( DongbuAnam Semiconductor (South Korea) ) Kim K ( DongbuAnam Semiconductor (South Korea) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 3
- 開始ページ:
- 61543K
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
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12
国際会議録
Study of mask structure for 45-nm node based on manufacturability and lithographic performance
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