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Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138]

著者名:
Park, S.J. ( DongbuAnam Semiconductor (South Korea) )
Shim, Y.A. ( DongbuAnam Semiconductor (South Korea) )
Kang, J.H. ( DongbuAnam Semiconductor (South Korea) )
Choi,J Y ( DongbuAnam Semiconductor (South Korea) )
Yoon K H ( DongbuAnam Semiconductor (South Korea) )
Lee Y S ( DongbuAnam Semiconductor (South Korea) )
Kim K ( DongbuAnam Semiconductor (South Korea) )
さらに 2 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
3
開始ページ:
61543K
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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