How to obtain accurate resist simulations in very low-kl era- [6154-107]
- 著者名:
Chiou T. B ( Asml TDC Asia (Taiwan) ) Park C. H ( Hynix Semiconductor Inc. (South Korea) ) Choi, J. S ( Hynix Semiconductor Inc. (South Korea) ) Min Y.-H ( ASML TDC Asia (Taiwan) ) Hansen S ( ASML TDC USA (USA) ) Tseng S. E ( ASML TDC Asia (Taiwan) ) Chen A C ( ASML TDC Asia (Taiwan) ) Yim D ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61542V
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
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