Predictive focus exposure modeling (FEM) for full-chip lithography [6154-66]
- 著者名:
Chen, L. ( Brion Technologies, Inc. (USA) ) Cao Y ( Brion Technologies, Inc. (USA) ) Liu H ( Brion Technologies, Inc. (USA) ) Shao W ( Brion Technologies, Inc. (USA) ) Feng M ( Brion Technologies, Inc. (USA) ) Ye, J ( Brion Technologies, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61541T
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Comparison of immersion lithography from projection and interferometric exposure tools [6154-179]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |