Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60]

Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60]

著者名:

Chen, T. ( ASML MaskTools (USA) )

Van Den Broeke D ( ASML MaskTools (USA) )

Hsu, S ( ASML MaskTools (USA) )

Park S ( ASML MaskTools (USA) )

Berger G ( ASML MaskTools (USA) )

Coskun T ( ASML MaskTools (USA) )

De Vocht J ( ASML MaskTools (USA) )

Corcoran N ( ASML MaskTools (USA) )

Chen F ( ASML MaskTools (USA) )

Van der Heijden ( ASML (Netherlands) )

Finders J ( ASML (Netherlands) )

Engelen A ( ASML (Netherlands) )

Socha, R ( ASML TDC (USA) )

さらに 8 件

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

2

開始ページ:

61541O

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117] Chen, T., Van Den Broeke, D., Tejnil, E., Hsu, S., Park, S., Berger, G., Coskun, T., De Vocht, J., Corcoran, N., Chen, … SPIE - The International Society of Optical Engineering	7 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N.P., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering
2 国際会議録 Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110] Chen, T., Van Den Broeke, D., Hsu, S., Park, S., Berger, G., Coskun, T., de Vocht, J., Chen, F., Socha, R., Park, J., … SPIE - The International Society of Optical Engineering	8 国際会議録 Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
3 国際会議録 RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114] Hsu, M., Chen, F. J., Van Den Broeke, D., En Tszng, S., Shieh, J., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering	9 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering
4 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering	10 国際会議録 An integrated lithography concept with application on 45-nm % pitch flash memory devices (Invited Paper) [6154-21] Dusa, M., Engelen, A., Finders, J. SPIE - The International Society of Optical Engineering
5 国際会議録 Precision process calibration and CD predictions for low-k1 lithography [5853-64] Chen, T., Park, S., Berger, G., Coskun, T. H., de Vocht, J., Chen, F., Yu, L., Hsu, S., van den Broeke, D., Socha, R., … SPIE - The International Society of Optical Engineering	11 国際会議録 Implementation of random contact hole design with CPL mask by using IML technology [5992-108] Hsu, M., Van Den Broeke, D., Hsu, S., Chen, J. F., Shi, X., Corcoran, N., Yu, L. SPIE - The International Society of Optical Engineering
6 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering	12 国際会議録 Experimental evaluation of bull’s-eye illumination for csslst-free random contact printing at sub-65nm node [6154-39] Finders, J., Engelen, A., Vandenberghe, G., Bekaert, J., Chen, T. SPIE - The International Society of Optical Engineering

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