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The improvement of DOF for sub-1OOnm process by focus scan [6154-56]

著者名:
Kim, J. C. ( Hynix Semiconductor Inc. (South Korea) )
Yang, H. J. ( Hynix Semiconductor Inc. (South Korea) )
Jeon J.-H ( Hynix Semiconductor Inc. (South Korea) )
Park C.-H ( Hynix Semiconductor Inc. (South Korea) )
Moon, J ( Hynix Semiconductor Inc. (South Korea) )
Yim D ( Hynix Semiconductor Inc. (South Korea) )
Kim J. W ( Hynix Semiconductor Inc. (South Korea) )
Tseng S ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
Rhe K.-K ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
Min Y.-H ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
Chen A C ( ASML Korea (South Korea) and ASML Technology Development Ctr. (Taiwan) )
さらに 6 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
2
開始ページ:
61541K
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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