Fast inverse lithography technology [6154-55]

Fast inverse lithography technology [6154-55]

著者名:

Abrams, D. S. ( LuminescentTechnologies, Inc. (USA) )
Pang, L. ( LuminescentTechnologies, Inc. (USA) )

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

2

開始ページ:

61541J

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 Inverse lithography technology (ILT): a natural solution for model-based SRAF at 45-nm and 32-nm L. Pang, Y. Liu, D. Abrams SPIE - The International Society of Optical Engineering	7 国際会議録 Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142] Chu, C. W., Tsao,B, Chiou, K., Lee, S., Huang, J., Liu, Y, Lin,T, Moore A, Pang,L SPIE - The International Society of Optical Engineering
2 国際会議録 Inverse lithography technology (OLT): What is the impact to the photomask industry? [6283-106] Pang, L., Liu, Y., Abrams, D. SPIE - The International Society of Optical Engineering	8 国際会議録 Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation [6154-58] Hung, C. Y., Zhang, B., Guo, E., Pang, L., Liu Y, Wang K, Dai G SPIE - The International Society of Optical Engineering
3 国際会議録 Inverse lithography technology principles in practice: unintuilive patterns [5992-102] Liu, Y., Abrams, D., Pang, L., Moore, A. SPIE - The International Society of Optical Engineering	9 国際会議録 First 65-nm tape-out using inverse lithography technology (ILT) [5992-67] Hung, C. -Y., Zhang, B., Tang, D., Guo, E., Pang, L., Liu, Y., Moore, A., Wang, K. SPIE - The International Society of Optical Engineering
4 国際会議録 Laser and e-beam mask-to-silicon with inverse lithography technology (ILT) [5992-74] Pang, L., Shamma, N., Rissman, P., Abrams, D. SPIE - The International Society of Optical Engineering	10 国際会議録 Considering MEEF in inverse lithography technology (ILT) and source mask optimization (SMO) L. Pang, G. Xiao, V. Tolani, P. Hu, T. Cecil Society of Photo-optical Instrumentation Engineers
5 国際会議録 Inverse lithography technology at low k1: placement and accuracy of assist features [6349-186] Moore, A., Lin, T., Liu, Y., Russell, G., Pang, L., Abrams, D. SPIE - The International Society of Optical Engineering	11 国際会議録 Evaluation of inverse lithography technology for 55nm-node memory device B. Cho, S. Ko, J. Choi, C.-K. Kim, H. Yang Society of Photo-optical Instrumentation Engineers
6 国際会議録 Inverse lithography technology at chip scale [6154-41] Lin, B., Shieh, M. F., Sun, J., Ho, J., Wang, Y., Wu, X., Leitermann, W., Lin, O., Lin, J., Liu, Y., Pang, L. SPIE - The International Society of Optical Engineering	12 国際会議録 Manufacturabilily study of masks created by inverse lithography technology (ILT) [5992-106] Martin, P. M., Progler, C. J., Xiao, G., Gray, R., Pang, L., Liu, Y. SPIE - The International Society of Optical Engineering

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