Experimental evaluation of bull’s-eye illumination for csslst-free random contact printing at sub-65nm node [6154-39]
- 著者名:
- Finders, J. ( ASML (Netherlands) )
- Engelen, A. ( ASML (Netherlands) )
- Vandenberghe, G. ( IMEC vzw (Belgium) )
- Bekaert, J. ( IMEC vzw (Belgium) )
- Chen, T. ( ASML Masktools(USA) )
- 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 615412
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
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SPIE-The International Society for Optical Engineering |
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3
国際会議録
Random 65nm..45nm C/H printing using optimized illumination source and CD sizing by post processing
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Compensating mask topography effects in CPL through-pitch solutions toward the 45nm node [5992-61]
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SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |