Alt-phase shift mask technology for 65nm logic applications [6154-22]

Alt-phase shift mask technology for 65nm logic applications [6154-22]

著者名:

Chakravorty, K. K. ( Intel Corp. (USA) )

Henrichs, S. ( Intel Corp. (USA) )

Qiu, W. ( Intel Corp. (USA) )

Chavez, J. L. ( Intel Corp. (USA) )

Liu, Y.-P. ( Intel Corp. (USA) )

Ghadiali, F. ( Intel Corp. (USA) )

Yung, K. ( Intel Corp. (USA) )

Wilcox, N. ( Intel Corp. (USA) )

Silva, M. ( Intel Corp. (USA) )

Ma, J. ( Intel Corp. (USA) )

Wu, P. ( Intel Corp. (USA) )

Irvine, B. ( Intel Corp. (USA) )

Yun, H. ( Intel Corp (USA) )

Cheng, W H ( Intel Corp (USA) )

Farnsworth, J ( Intel Corp (USA) )

さらに 10 件

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

1

開始ページ:

61540M

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase-shift mask [5992-62] Ma, J., Han, K., Lee, K., Korobko, Y., Silva, M., Chavez, J., Irvine, B., Henrichs, S., Chakravorty, K., Olshausen, R., … SPIE - The International Society of Optical Engineering	7 国際会議録 Study of alternating phase-shift mask structure for 65-nm node devices Konishi, T., Komizo, T., Takahashi, H., Morita, M., Ohshima, T., Chiba, K., Kojima, Y., Sasaki, J., Tanaka, K., Otaki, … SPIE - The International Society of Optical Engineering
2 国際会議録 Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond Cheng, W.-H., Chakravorty, K.K., Farnsworth, J.N. SPIE-The International Society for Optical Engineering	8 国際会議録 Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode Montgomery, P.K., Lucas, K.D., Litt, L.C., Conley, W., Fanucchi, E., Van Wingerden, J., Vandenberghe, G., Wiaux, V., … SPIE - The International Society of Optical Engineering
3 国際会議録 Technological challenges in implementation of alternating phase-shift mask Tsai,W., Qian,Q., Buckmann,K.M., Cheng,W.-H., He,L., Irvine,B., Kamna,M., Korobko,Y., Kovalchick,M., Labovitz,S.M., … SPIE-The International Society for Optical Engineering	9 国際会議録 Second generation fluids for 193nm immersion lithography [6154-42] French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, … SPIE - The International Society of Optical Engineering
4 国際会議録 Fabrication of defect-free full-field pixelated phase mask W.-H. Cheng, J. Farnsworth, W. Kwok, A. Jamieson, N. Wilcox Society of Photo-optical Instrumentation Engineers	10 国際会議録 Fundamental limit of ebeam lithography W. -H. Cheng, J. Farnsworth SPIE - The International Society of Optical Engineering
5 国際会議録 Tritone inspection for embedded phase-shift mask Cheng,W.-H., Farnsworth,J.N., Tenjil,E. SPIE-The International Society for Optical Engineering	11 国際会議録 Preliminary study of 65-nm-node alternating phase-shift mask fabrication Hosono, K., Ishikawa, N., Asai, S., Maruyama, H., Miyahara, Y., Sasaki, S., Yamashita, Y., Hotta, Y., Furukawa, T., … SPIE-The International Society for Optical Engineering
6 国際会議録 Alternatives to alternating phase-shift masks for 65 nm Torres, J.A., Maurer, W. SPIE-The International Society for Optical Engineering	12 国際会議録 Mask-making study for the 65-nm node Chen, C.-J., Lee, H.-C., Lu, C.-L., Hsieh, R.-G., Chen, W.-C., Hsieh, H.-C., Lin, B.-J. SPIE - The International Society of Optical Engineering

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