Enabling the 45nm node by hyper-NA polarized lithography [6154-11]
- 著者名:
De Boeij, W. ( ASML Netherlands B.V. (Netherlands) ) Swinkels, G ( ASML Netherlands B.V. (Netherlands) ) Le Masson, N. ( ASML Netherlands B.V. (Netherlands) ) Koolen, A. ( ASML Netherlands B.V. (Netherlands) ) Van Greevembroek, H. ( ASML Netherlands B.V. (Netherlands) ) Klaassen, M. ( ASML Netherlands B.V. (Netherlands) ) Van de Kerkhof, M. ( ASML Netherlands B.V. (Netherlands) ) Van Ingen Schenau, K. ( ASML Netherlands B.V. (Netherlands) ) De Winter, L. ( ASML Netherlands B.V. (Netherlands) ) Wehrens, M. ( ASML Netherlands B.V. (Netherlands) ) Hansen, S. ( ASML Netherlands B.V. (Netherlands) ) Wagner, C. ( ASML Netherlands B.V. (Netherlands) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61540B
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
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12
国際会議録
Effect of azimuthally polarized illumination imaging on device patterns beyond 45-nm node [6154-12]
SPIE - The International Society of Optical Engineering |