Immersion lithography robustness for the C065 node [6154-07]
- 著者名:
Warrick, S. ( Freescale Semiconductors (France) ) Morton, R. ( Philips Semiconductors (France) ) Mauri, A. ( STMicroelectronics (France) ) Chapon, J. D ( STMicroelectronics (France) ) Belledent, J. ( Philps Semiconductors (France) ) Conley, W. ( Freescale Semiconductors (France) ) Barr, A. ( Freescale Semiconductors (France) ) Lucas, K. ( Freescale Semiconductors (France) ) Monget, C. ( STMicroelectronics (France) ) Plantier, V. ( Philips Semiconductors (France) ) Cruau, D. ( Freescale Semiconductors (France) ) Gomez, J.-M. ( Freescale Semiconductors (France) ) Sicurani, E ( CEA (France) ) Gemmink, J-W. ( Philips Semiconductors (France) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 615407
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |