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A lamp thermoelectricity based integrated bake/chill system for advanced photoresist processing [6153-175]

著者名:
  • Tay, A. ( National Univ. of Singapore (Singapore) )
  • Chua, H.-I. ( Univ. of Western Australia (Australia) )
  • Wu, X. ( National Univ. of Singapore (Singapore) )
  • Wang, Y. ( National Univ. of Singapore (Singapore) )
掲載資料名:
Advances in Resist Technology and Processing XXIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6153
発行年:
2006
パート:
2
開始ページ:
61534M
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
言語:
英語
請求記号:
P63600/6153
資料種別:
国際会議録

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