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Design and development of next-generation bottom anti-reflective coatings for 45.nm process with hyper NA lithography [6153-96]

著者名:
Nakajima, M. ( Nissan Chemical Industries, Ltd.(Japan) )
Sakaguchi, T. ( Nissan Chemical Industries, Ltd.(Japan) )
Hashimoto, K. ( Nissan Chemical Industries, Ltd.(Japan) )
Sakamoto, R. ( Nissan Chemical Industries, Ltd.(Japan) )
Klshioko, T. ( Nissan Chemical Industries, Ltd.(Japan) )
Takei, S. ( Nissan Chemical Industries, Ltd.(Japan) )
Enomoto, T. ( Nissan Chemical Industries, Ltd.(Japan) )
Nakajima, Y. ( Nissan Chemical Industries, Ltd.(Japan) )
さらに 3 件
掲載資料名:
Advances in Resist Technology and Processing XXIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6153
発行年:
2006
パート:
2
開始ページ:
61532L
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
言語:
英語
請求記号:
P63600/6153
資料種別:
国際会議録

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