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Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]

著者名:
Jung, J C ( Hynix Semiconductor Inc. (South Korea) )
Lee, S K ( Hynix Semiconductor Inc. (South Korea) )
Ban, K D ( Hynix Semiconductor Inc. (South Korea) )
Bok C ( Hynix Semiconductor Inc. (South Korea) )
Kim H S ( Hynix Semiconductor Inc. (South Korea) )
Moon, S C ( Hynix Semiconductor Inc. (South Korea) )
Kim, J ( Hynix Semiconductor Inc. (South Korea) )
さらに 2 件
掲載資料名:
Advances in Resist Technology and Processing XXIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6153
発行年:
2006
パート:
1
開始ページ:
61531Z
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
言語:
英語
請求記号:
P63600/6153
資料種別:
国際会議録

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