Comparison of I-line and DUV high-energy implant litho processes [6152-155]

Comparison of I-line and DUV high-energy implant litho processes [6152-155]

著者名:

Grandpierre, A G. ( Infineon Technologies SC300 GmbH &Co. OHG (Germany) )
Berger, C. ( Infineon Technologies SC300 GmbH &Co. OHG (Germany) )
Schroeder, U. P. ( Infineon Technologies North America (USA) )
Schiwon, R. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )
Kubis, M. ( Infineon Technologies SC300 GmbH & Co. OHG (Germany) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6152

発行年:

2006

パート:

2

開始ページ:

61523V

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461957 [0819461954]

言語:

英語

請求記号:

P63600/6152

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016184
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, Inspection, and Process Control for Microlithography
回次:	2006 : 20th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.20-2006.02.23

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