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Characterizing optical proximity effect difference among exposure tools [6152-103]

著者名:
Hong, J. ( Hynix Semiconductor Inc. (South Korea) )
Lee, J. ( Hynix Semiconductor Inc. (South Korea) )
Kang, E. ( Hynix Semiconductor Inc. (South Korea) )
Yang, H. ( Hynix Semiconductor Inc. (South Korea) )
Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
さらに 1 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
2
開始ページ:
61522N
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

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