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The study to enhance the accuracy of FIB repair on mask pattern of DRAM [6152-94]

著者名:
  • Choi, Y. ( Hynix Semiconductor (South Korea) )
  • Kim, H. ( Hynix Semiconductor (South Korea) )
  • Kim, S. ( Hynix Semiconductor (South Korea) )
  • Han, O. ( Hynix Semiconductor (South Korea) )
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
2
開始ページ:
61522H
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

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