The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
- 著者名:
Holsteyns, F. ( IMEC (Belgium) ) Cheung, L. ( KLA-Tencor (USA) ) Van Den Heuvel, D. ( IMEC ) Marcuccilli, G ( KLA-Tencor (USA) ) Simposon, G. ( KLA-Tencor (USA) ) Brun, R. ( KLA-Tencor (USA) ) Steinbach, A.. ( KLA-Tencor (USA) ) Fyen, W. ( IMEC (Belgium) ) Vangoidsenhoven, D. ( IMEC (Belgium) ) Merten, P. ( IMEC (Belgium) ) Maenhoudt, M. ( IMEC (Belgium) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61521U
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
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2
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