In-line TEM sample preparation and wafer return strategy for rapid yield learning [6152-81]
- 著者名:
Bicais-Lepinay, N. ( STMicroelectronics (France) ) Andre, F. ( STMicroelectronics (France) ) Brevers, S. ( STMicroelectronics (France) ) Guyader, P. ( STMicroelectronics (France) ) Trouiller, C. ( STMicroelectronics (France) ) Kwakman, L. F. Tz. ( Philips Semiconductors (France) ) Pokrant, S. ( Philips Semiconductors (France) ) Verkleij, D. ( FEI Co. (Netherlands) ) Schampers, R. ( FEI Co. (Netherlands) ) Ithier, L. ( STMicroelectrpronics (France) ) Sicurani, E. ( CEA-LETI (France) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 615217
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering | |
Materials Research Society |
Trans Tech Publications |
5
国際会議録
A HF VAPOUR ETCH PROCESS FOR INTEGRATION IN CLUSTER-TOOL PROCESSES: CHARACTERISTICS AND APPLICATIONS
Electrochemical Society |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
12
国際会議録
The use of unpatterned wafer inspection for immersion lithography defectivity studies [6152-68]
SPIE - The International Society of Optical Engineering |