Application of optical CD metrology based on both spectroscopic ellipsometry and scatterometry for Si-recess monitor [6152-17]
- 著者名:
Huang, P. C. Y. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Chen, R. C. J. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Chen, F. C. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Perng, B. C. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Shieh, J. H. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Jang, S. M. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) Liang, M. S. ( Taiwan Semiconductor Manufacturing Co. (Taiwan) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61520H
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
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2
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Application of spectroscopic ellipsometry-based scatterometry for ultrathin spacer structure
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Application of scatterometry for CD and profile metrology in 193-nm lithography process development
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Scatterometry measurements of line end shortening structures for focus-exposure monitoring [6152-70]
SPIE - The International Society of Optical Engineering |