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Improved scatterometry method of critical dimension measurements and its application for control of development process [6152-16]

著者名:
  • Pundaleva, I. ( Samsung Electronics Co. (South Korea) )
  • Nam, D. ( Samsung Electronics Co. (South Korea) )
  • Han, H. ( Samsung Electronics Co. (South Korea) )
  • Lee, D. ( Samsung Electronics Co. (South Korea) )
  • Han, W. ( Samsung Electronics Co. (South Korea) )
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6152
発行年:
2006
パート:
1
開始ページ:
61520G
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
言語:
英語
請求記号:
P63600/6152
資料種別:
国際会議録

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