Improved scatterometry method of critical dimension measurements and its application for control of development process [6152-16]
- 著者名:
- Pundaleva, I. ( Samsung Electronics Co. (South Korea) )
- Nam, D. ( Samsung Electronics Co. (South Korea) )
- Han, H. ( Samsung Electronics Co. (South Korea) )
- Lee, D. ( Samsung Electronics Co. (South Korea) )
- Han, W. ( Samsung Electronics Co. (South Korea) )
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61520G
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
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