Characterization of line edge roughness using CD-SAXS [6152-23]
- 著者名:
Jones, R.J. ( National Institute of Standards and Technologh (USA) ) Wu, W. ( National Institute of Standards and Technologh (USA) ) Wang, C. ( National Institute of Standards and Technologh (USA) ) Lin, E. K. ( National Institute of Standards and Technologh (USA) ) Choi, K. ( National Institute of Standards and Technology (USA)and Intel (USA) ) Rice, B. J. ( Intel (USA) ) Thompson, G. M. ( Intel (USA) ) Weigand, S. J. ( Advanced Photon Source (USA) ) Keane, D. T ( DAD-CAT, Advanced Photon Source (USA) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6152
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61520N
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461957 [0819461954]
- 言語:
- 英語
- 請求記号:
- P63600/6152
- 資料種別:
- 国際会議録
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Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM
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Deprotection volume characteristics and line-edge morphology in chemcially amplified resists
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