Multilayer optics with spectral purity layers for the EUV wavelength range [6151-155]

Multilayer optics with spectral purity layers for the EUV wavelength range [6151-155]

著者名:

Louis, E. ( FOM Institute far Plasma Physics Rijnhuizen (Netherlands) )

Van de Kruijs, R. W. E ( FOM Institute far Plasma Physics Rijnhuizen (Netherlands) )

Yakshin, A. E. ( FOM Institute far Plasma Physics Rijnhuizen (Netherlands) )

Van der Westen, S. A ( FOM Institute far Plasma Physics Rijnhuizen (Netherlands) )

Bijkerk, F. ( FOM Institute far Plasma Physics Rijnhuizen (Netherlands) )

Van Herpen, M. M. J. W. ( Philips Research Labs. (Netherlands) )

Klunder, D. J. W ( Philips Research Labs. (Netherlands) )

Bakker, L. ( Philips Research Labs. (Netherlands) )

Enkisch, H. ( Carl Zeiss SMT AG (Germany) )

Mullender, S ( Carl Zeiss SMT AG (Germany) )

Richter, M. ( Physikalisch-Technische Bundesanstalt (Germany) )

Bonine, V.

さらに 7 件

掲載資料名:

Emerging Lithographic Technologies X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6151

発行年:

2006

パート:

2

開始ページ:

615139

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461940 [0819461946]

言語:

英語

請求記号:

P63600/6151

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016183
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2006 : 10th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.23

類似資料:

1 国際会議録 Enhanced performance of EUV multilayer coatings [5900-02] Louis, F., Yakshin, A. E., Zoethout, E., van de Kruijs, R. W. E., Nedelcu, I., van der Westen, S. A., Tsarfati, T., … SPIE - The International Society of Optical Engineering	7 国際会議録 Debris mitigation for EUV sources using directional gas flows [6151-160] Soer, W., Klunder, D., Van Herpen, M., Bakker, L., Banine, V. SPIE - The International Society of Optical Engineering
2 国際会議録 Substrate recovery layers for EUVL optics: effects on multilayer reflectivity and surface roughness I. Nedelcu, R. W. E. de Kruijs, A. E. Yakshin, E. Louis, F. Bijkerk, S. Mullender SPIE - The International Society of Optical Engineering	8 国際会議録 Progress in Mo/Si multilayer coating technology for EUVL optics Louis,E., Yakshin,A.E., Gorts,P.C., Oestreich,S., Stuik,R., Maas,E.L.G., Kessels,M.J.H., Bijkerk,F., Haidl,M., … SPIE - The International Society for Optical Engineering
3 国際会議録 Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition A. E. Yakshin, R. W. E. de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk, H. Enkisch, S. Mullender SPIE - The International Society of Optical Engineering	9 国際会議録 Multilayer reflectance during exposure to EUV radiation Oestreich,S., Klein,R., Scholze,F., Jonkers,J., Louis,E., Yakshin,A.E., Gorts,P.C., Ulm,G., Haidl,M., Bijkerk,F. SPIE-The International Society for Optical Engineering
4 国際会議録 Process control of photoresist undercut for lift-off patterns below 100 nm Louis, E., Zoethout, E., van de Kruijs, R. W. E., Nedelcu, I., Yakshin, A. E., van der Westen, S. Alonso, Tsarfati, T., … SPIE - The International Society of Optical Engineering	10 国際会議録 Smoothing properties of single- and multilayer coatings: a method to smoothen substrates A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Alonso van der Westen, F. Bijkerk Society of Photo-optical Instrumentation Engineers
5 国際会議録 Subatomic accuracy in EUVL multilayer coatings Zoethout, E., Suter, P., van de Kruijs, R.W., Yakshin, A.E., Louis, E., Bijkerk, F., Enkisch, H., Muellender, S. SPIE - The International Society of Optical Engineering	11 国際会議録 Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB[6151-18] Laubis, C., Buchholz, C., Fischer, A., Ploger, S., Scholz, F., Wagner, H., Scholze, F., Ulm, G., Enkisch, H., Mullender, … SPIE - The International Society of Optical Engineering
6 国際会議録 Stress mitigation in Mo/Si multilayers for EUV lithography Zoethout, E., Sipos, G., Kruijs, R.W., Yakshin, A.E., Louis, E., Muellender, S., Bijkerk, F. SPIE-The International Society for Optical Engineering	12 国際会議録 Control of defects in EUV multilayers and demonstration of at-wavelength defect characterization by EUV microscopy Louis,E., den Hartog,M.J.H., Maas,E.L.G., Bijkerk,F. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12