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Reduced complexity compression algorithms for direct-write maskless lithography systems [6151-84]

著者名:
  • Liu H. I. ( Univ. of California/Berkeley (USA) )
  • Dai V. ( Univ. of California/Berkeley (USA) )
  • Zakhor A. ( Univ. of California/Berkeley (USA) )
  • Nikolic B. ( Univ. of California/Berkeley (USA) )
掲載資料名:
Emerging Lithographic Technologies X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6151
発行年:
2006
パート:
2
開始ページ:
61512B
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461940 [0819461946]
言語:
英語
請求記号:
P63600/6151
資料種別:
国際会議録

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